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�{�׳߶�(<200 nm)��Ⱦ��V��ˮ�h(hu��n)��. ��ʹ�Â��y(t��ng)�՚��Ⱦ��b��ʽ��wϴ��̎��՚�r, �{��Ⱦ�ﱻ�D(zhu��n)�Ƹ��Uˮ��[1];��һЩ��y(t��ng)��I(y��)�U��H��ؽ��ٻ��ЙC��Ⱦ��ļ{�׏U��[2]. ��, �댧(d��o)�w��칤�I(y��)�е�CMP(chemical mechanical planarization)�Uˮ�к��~�{��w��(68~120 nm)[3], ��҇��ȉA��Ṥ�Sÿ��a(ch��n)��^ 80 �f��ĺ�� Mg(OH)2�ļ{�׏U��[2].

�S��{�׼��g(sh��)�İl(f��)չ�ͼ{�ײ��ϵďV��(y��ng)��, �˹��{�ײ��Ҳ��ɱ��ر��ŷŵ�ˮ�h(hu��n)��.��о��, �{�ײ��ϵĶ��Բ��H��䱾��Ķ��, ߀��Ӱ��ж��|(zh��)��ɡ��w��D(zhu��n)��ͱ�¶[4,5].

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